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The CIF AR19.5 is a specialised tool designed for precision in the creation of etch-resistant patterns on various substrates, particularly in the field of electronics and circuit design. This pen is tailored for professionals and hobbyists who require exact and reliable lines that resist etching solutions. Featuring a fine-point tip, the CIF AR19.5 pen allows for the drawing of intricate patterns with high accuracy. The ink is formulated to provide a sharp contrast against most backgrounds, ensuring visibility during the etching process. The pen's ergonomic design ensures ease of use, minimising hand fatigue during extended periods of work.
The ink used in the AR19.5 is chemically engineered to be resistant to common etching solutions such as ferric chloride and ammonium persulfate. Upon application, it dries quickly, forming a robust layer that effectively protects underlying materials during the etching process. This unique composition ensures that the lines drawn do not spread or bleed, maintaining the precision of the design.
The CIF AR19.5 Etch Resist Ink Pen is extensively used in:
For more information please check the datasheets.
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